Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5567-5571

  Hoche, H ^a   Allebrandt, D ^a   Bruns, M ^b   Riedel, Ralf ^a   Fasel, C ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

High temperature properties; PVD; SiCN; Wear

Indexed keywords

SILICON; SILICON CARBIDE;

CHEMICAL-; HIGH TEMPERATURE PROPERTIES; PVD; SICN; STRUCTURAL PROPERTIES; TIE LINES; TRIBOLOGICAL BEHAVIORS; WEAR;

CHEMICAL PROPERTIES;

EID: 50349094236     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.126     Document Type: Article

References (30)

1. Kacsich T., and Lieb K.-P. Thin Solid Films 235 (1994) 4
2. Ernsberger C., Nickerson J., Smith T., Miller A.E., and Banks D. J. Vac. Sci. Technol. A4 (1986) 2784
3. Mocaer D., et al. J. Mater. Sci. 28 (1993) 2615
4. Haluschka C., et al. J. Eur. Ceram. Soc. 20 (2000) 1355
5. Riedel R., et al. Nature 374 (1995) 526
6. Raj R., An L., Shah S., Riedel R., Fasel C., and Kleebe H.J. J. Am. Ceram. Soc. 84 (2001) 1803
7. Riedel R., et al. J. Am. Ceram. Soc. 81 (1998) 3341
8. Baia Neto A.L., et al. Thin Solid Films 293 (1997) 206
9. Sundaram K.B., et al. Mater. Sci. Eng. A368 (2004) 103
10. Bielinsky D., et al. Tribol. Lett. 13 2 (2002)
11. Fernández-Ramos C., et al. Diam. Relat. Mater. 11 (2002) 169
12. Probst D., et al. Surf. Coat. Technol. 200/1-4 (2005) 355
13. Xiao X., Li Y., Song L., Peng X., and Hu X. Appl. Surf. Sci. 156 (2000) 155
14. Peng X., Song L., Meng J., Zhang Y., and Hu X. Appl. Surf. Sci. 173 (2001) 313
15. Sundaram K.B., and Alizadeh J. Thin Solid Films 370 (2000) 151
16. Machorro R., Samano E.C., Soto G., and Cata L. Appl. Surf. Sci. 127-129 (1998) 564
17. Kleps I., Angelescu A., Caccavale F., Brusatin G., and Armelao L. Vacuum 46 (1995) 979
18. Chen L.Y., and Hong F.C.N. Diam. Relat. Mater. 12 (2003) 968
19. Fainer N.I., Rumyantsev Yu.M., Golubenko A.N., Kosinova M.L., and Kuznetsov F.A. J. Cryst. Growth 248 (2003) 175
20. Marx G., Koerner K.-U., and Heger P. Steel Res. 72 (2001) 518
21. Wilden J., Wank A., Asmann M., Heberlein J.V.R., Boulos M.I., and Gitzhofer F. Appl. Organomet. Chem. 15 (2001) 841
22. Kuo D.H., and Yang D.G. Thin Solid Films 374 (2000) 92
23. Bendeddouche A., Berjoan A., Beche E., Merle-Mejean T., Schamm S., Serin V., Taillades G., Pradel A., and Hillel R. J. Appl. Phys. 81 (1997) 6147
24. Bendeddouche A., Berjoan R., Beche E., and Hillel R. Surf. Coat. Technol. 111 (1999) 184
25. Kamata K., Maeda Y., and Moriyama M. J. Mater. Sci. Lett. 5 (1986) 1051
26. Zhang W., and Wang J.T. Surf. Coat. Technol. 50 (1991) 11
27. Chen L.C., Chen K.H., Wei S.L., Kichambare P.D., Wu J.J., Lu T.R., and Kuo C.T. Thin Solid Films 355/356 (1999) 112
28. Chen K.H., Wu J.J., Chen C.Y., Chen L.C., Fan C.W., Kuo P.F., Chen Y.F., and Huang Y.S. Thin Solid Films 355/356 (1999) 205
29. Neuville S., and Mathews A. Thin Solid Films 515 (2007) 6619
30. Klaffke D., Wäsche R., Janakiraman N., and Aldinger F. Wear 260 (2006) 711