Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Bultinck, Evi ^a   Mahieu, Stijn ^b   Depla, Diederik ^b   Bogaerts, Annemie ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

Magnetron; Modeling; Plasma; Sputter deposition

Indexed keywords

CATHODE CURRENTS; COLLISIONS MODELS; ION FLUXES; MAGNETRON DISCHARGES; MAGNETRON MODELING; NITRIDE LAYERS; PLASMA SPUTTER DEPOSITION; REACTIVE GAS MIXTURES; REACTIVE SPUTTER DEPOSITION; SPUTTERED ATOMS; TITANIUM TARGETS;

ELECTRIC DISCHARGES; MAGNETRONS; SPUTTER DEPOSITION; TARGETS; TITANIUM; TITANIUM NITRIDE;

PLASMA DEPOSITION;

EID: 77954894499     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931904     Document Type: Conference Paper

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