Novel electrode materials based on ion beam induced deposition of platinum carbon composites

Electrochimica Acta

Volumn 55, Issue 20, 2010, Pages 5725-5732

  Wiedemair, Justyna ^a   Menegazzo, Nicola ^b   Pikarsky, Joel ^a   Booksh, Karl S ^b   Mizaikoff, Boris ^c   Kranz, Christine ^c  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b UNIVERSITY OF DELAWARE   (United States)

^c UNIVERSITY OF ULM   (Germany)

Author keywords

Electron transfer; Focused ion beam (FIB); Ion beam induced deposition; Maskless micro fabrication; Platinum carbon composite electrodes

Indexed keywords

AMBIENT ATMOSPHERE; ANNEALING PROCEDURES; CARBON COMPOSITES; DEPOSITED MATERIALS; ELECTRODE MATERIAL; ELECTRODE SURFACES; ELECTRON TRANSFER; ELEVATED TEMPERATURE; ENERGY DISPERSIVE X RAY SPECTROSCOPY; HETEROGENEOUS ELECTRON TRANSFER; ION BEAM INDUCED DEPOSITION; MASK LESS; PLATINUM CONCENTRATION; POTASSIUM HEXACYANOFERRATE; RAMAN SPECTRA; SURFACE FEATURE; THREE ORDERS OF MAGNITUDE;

ANNEALING; ATOMIC FORCE MICROSCOPY; BEAM PLASMA INTERACTIONS; CARBON CARBON COMPOSITES; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL OXIDATION; ELECTRON TRANSITIONS; FOCUSED ION BEAMS; INTERMETALLICS; ION BOMBARDMENT; IONS; MATERIALS; PLATINUM; PLATINUM COMPOUNDS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SULFURIC ACID; SURFACE STRUCTURE; X RAY SPECTROSCOPY;

ELECTROCHEMICAL ELECTRODES;

EID: 77954176125     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.05.008     Document Type: Article

References (51)

1. M.P. Nagale, and I. Fritsch Anal. Chem. 70 1998 2902
2. M.P. Nagale, and I. Fritsch Anal. Chem. 70 1998 2908
3. C.S. Henry, and I. Fritsch Anal. Chem. 71 1999 550
4. R. Feeney, and S.P. Kounaves Electroanalysis 12 2000 677
5. J. Wang, J. Lu, B. Tian, and C. Yarnitzky J. Electroanal. Chem. 361 1993 77
6. C. Kranz, G. Friedbacher, B. Mizaikoff, A. Lugstein, J. Smoliner, and E. Bertagnolli Anal. Chem. 73 2001 2491
7. A. Kueng, C. Kranz, A. Lugstein, E. Bertagnolli, and B. Mizaikoff Angew. Chem. Int. Ed. 44 2005 3419
8. J.F. Lin, J.P. Bird, L. Rotkina, and P.A. Bennett Appl. Phys. Lett. 82 2003 802
9. E.S. Sadki, S. Ooi, and K. Hirata Appl. Phys. Lett. 85 2004 6206
10. P.G. Li, A.Z. Jin, and W.H. Tang Phys. Status Solidi A: Appl. Mater. Sci. 203 2006 282
11. G. De Marzi, D. Iacopino, A.J. Quinn, and G. Redmond J. Appl. Phys. 96 2004 3458
12. F. Hernandez-Ramirez, J. Rodriguez, O. Casals, E. Russinyol, A. Vila, A. Romano-Rodriguez, J.R. Morante, and M. Abid Sens. Actuators B 118 2006 198
13. D. Tham, C.-Y. Nam, and J.E. Fischer Adv. Mater. 18 2006 290
14. A. Vila, F. Hernandez-Ramirez, J. Rodriguez, O. Casals, A. Romano-Rodriguez, J.R. Morante, and M. Abid Mater. Sci. Eng. 26 2006 1063
15. A. Wagner, J.P. Levin, J.L. Mauer, P.G. Blauner, S.J. Kirch, and P. Longo J. Vac. Sci. Technol. B 8 1990 1557
16. S. Matsui, T. Kaito, J.-I. Fujita, M. Komuro, K. Kanda, and Y. Haruyama J. Vac. Sci. Technol. B 18 2000 3181
17. S.M. Allameh, N. Yao, and W.O. Soboyejo Scripta Mater. 50 2004 915
18. T. Tao, W. Wilkinson, and J. Melngailis J. Vac. Sci. Technol. B 9 1991 162
19. R.J. Young, and J. Puretz J. Vac. Sci. Technol. B 13 1995 2576
20. K. Edinger, J. Melngailis, and J. Orloff J. Vac. Sci. Technol. B 16 1998 3311
21. A. Folch, J. Tejada, C.H. Peters, and M.S. Wrighton Appl. Phys. Lett. 66 1995 2080
22. K. Edinger, T. Gotszalk, and I.W. Rangelow J. Vac. Sci. Technol. B 19 2001 2856
23. V. Gopal, E.A. Stach, V.R. Radmilovic, and I.A. Mowat Appl. Phys. Lett. 85 2004 49
24. D. Spoddig, K. Schindler, P. Roediger, J. Barzola-Quiquia, K. Fritsch, H. Mulders, and P. Esquinazi Nanotechnology 18 2007 495202
25. T. Tao, J.S. Ro, J. Melngailis, Z. Xue, and H.D. Kaesz J. Vac. Sci. Technol. B 8 1990 1826
26. K.A. Telari, B.R. Rogers, H. Fang, L. Shen, R.A. Weller, and D.N. Braski J. Vac. Sci. Technol. B 20 2002 590
27. R.M. Langford, T.X. Wang, and D. Ozkaya Microelectron. Eng. 84 2007 784
28. R.L. McCreery, and K.K. Cline P. Kissinger, W.R. Heineman, Laboratory Techniques in Electroanalytical Chemistry 2nd ed. 1996 CRC Press 293
29. P.G. Blauner, Y. Butt, J.S. Ro, C.V. Thompson, and J. Melngailis J. Vac. Sci. Technol. B 7 1989 1816
30. A.D. Della Ratta, J. Melngailis, and C.V. Thompson J. Vac. Sci. Technol. B 11 1993 2195
31. A. Botman, J.J.L. Mulders, R. Weemaes, and S. Mentink Nanotechnology 17 2006 3779
32. R.M. Langford, D. Ozkaya, J. Sheridan, and R. Chater Microsc. Microanal. 10 2004 1122
33. I. Utke, P. Hoffmann, B. Dwir, K. Leifer, E. Kapon, and P. Doppelt J. Vac. Sci. Technol. B 18 2000 3168
34. A. Botman, M. Hesselberth, and J.J.L. Mulders Microelectron. Eng. 85 2008 1139
35. Z.-M. Liao, J. Xu, X.-Z. Zhang, and D.-P. Yu Nanotechnology 19 2008 305402
36. http://www.elchsoft.com/.
37. A.C. Ferrari, and J.J. Robertson Phys. Rev. B: Condens. Matter: Mater. Phys. 61 2000 14095
38. C. Jin, H. Zhou, S. Graham, and R.J. Narayan Appl. Surf. Sci. 253 2007 6487
39. N.M.J. Conway, A.C. Ferrari, A.J. Flewit, J. Robertson, W.I. Milne, A. Tagliaferro, and W. Beyer Diamond Relat. Mater. 9 2000 765
40. R. McCann, S.S. Roy, P. Papakonstantinou, M.F. Bain, H.S. Gamble, and J.A. McLaughlin Thin Solid Films 482 2005 34
41. R. Kometani, T. Ichihashi, K. Kanda, T. Suzuki, K. Niihara, S. Ishihara, T. Kaito, and S. Matsui J. Vac. Sci. Technol. B 26 2008 2628
42. Z.M. Liao, J. Xu, Y.P. Song, Y. Zhang, Y.J. Xing, and D.P. Yu Appl. Phys. Lett. 2005 182112
43. R.L. McCreery Chem. Rev. 108 2008 2646
44. R.L. McCreery A.J. Bard, Electroanalytical Chemistry vol. 17 1991 Marcel Dekker New York
45. P. Chen, and R.L. McCreery Anal. Chem. 68 1996 3958
46. E.L. Goldstein, and M.R. Van de Mark Electrochim. Acta 27 1982 1079
47. H.B. Martin, A. Argoitia, U. Landau, A.B. Anderson, and J.C. Angus J. Electrochem. Soc. 143 1996 L133
48. K. Yoo, B. Miller, R. Kalish, and X. Shi Electrochem. Solid State Lett. 2 1999 233
49. A. Zeng, E. Liu, S.N. Tan, S. Zhang, and J. Gao Electroanalysis 14 2002 1110
50. J.A. Bennett, J. Wang, Y. Show, and G.M. Swain J. Electrochem. Soc. 151 2004 E306
51. A.J. Bard, and L.R. Faulkner Electrochemical Methods. Fundamentals and Applications 2nd ed. 2001 John Wiley & Sons, Inc. New York