Layout impact of resolution enhancement techniques: Impediment or opportunity?

Proceedings of the International Symposium on Physical Design

Volumn , Issue , 2003, Pages 110-117

  Liebmann, Lars W ^a  

^a IBM   (United States)

Author keywords

Design for manufacturability; Lithography; Radically restricted designs; Resolution enhancement techniques

Indexed keywords

MICROPROCESSOR CHIPS; OPTICAL RESOLVING POWER; OPTIMIZATION; PHOTOLITHOGRAPHY;

RESOLUTION ENHANCEMENT;

INTEGRATED CIRCUIT LAYOUT;

EID: 0038158890     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

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