OPC-free and minimally irregular IC design style

Proceedings - Design Automation Conference

Volumn , Issue , 2007, Pages 954-957

  Maly, W ^a   Lin, Yi Wei ^b   Marek Sadowska, M ^b  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Advanced technology; Design paradigm; DFM; IC layout regularity; Manufacturability; Multiple exposure; OPC free; VLSI

Indexed keywords

ADVANCED TECHNOLOGY; DESIGN PARADIGM; DFM; IC LAYOUT REGULARITY; MANUFACTURABILITY; MULTIPLE EXPOSURE; OPC FREE;

CELLULAR MANUFACTURING; DESIGN AIDS; ENCAPSULATION; PROBLEM SOLVING; TRANSISTORS; VLSI CIRCUITS;

INTEGRATED CIRCUIT LAYOUT;

EID: 34547343618     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/DAC.2007.375302     Document Type: Conference Paper

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