Enabling technology scaling with "in production" lithography processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Jhaveri, Tejas ^a   Strojwas, Andrzej ^a   Pileggi, Larry ^a   Rovner, Vyacheslav ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

Bricks; FEOL limited fabric; Regular design fabrics

Indexed keywords

(2+1)-DIMENSIONAL; AR(1) PROCESS; AREA PENALTY; CIRCUIT TOPOLOGIES; CO-OPTIMIZATION; CONVENTIONAL DESIGNS; CURRENT GENERATION; EFFICIENT IMPLEMENTATION; FRONT END OF LINE (FEOL); LAYOUT PATTERNS; LITHOGRAPHY PROCESSES; OPTICAL LITHOGRAPHY; OPTICAL MICRO LITHOGRAPHY; PRODUCTION LITHOGRAPHY; SIMULATION RESULTS; SINGLE EXPOSURE; STANDARD CELLS; TECHNOLOGY SCALING;

AEROSPACE APPLICATIONS; ARCHITECTURAL DESIGN; COBALT; COBALT COMPOUNDS; COMPUTER NETWORKS; CURVE FITTING; ELECTRIC BATTERIES; ELECTRIC NETWORK TOPOLOGY; FABRICS; LAWS AND LEGISLATION; MICROFLUIDICS; NETWORKS (CIRCUITS); PHOTOLITHOGRAPHY; PROCESS DESIGN; SODIUM; STANDARDS; TECHNOLOGY;

PROCESS ENGINEERING;

EID: 45449099922     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.776484     Document Type: Conference Paper

References (10)

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