Maximization of layout printability/manufacturability by extreme layout regularity

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 3, 2007, Pages

  Jhaveri, Tejas ^a   Rovner, Vyacheslav ^a   Pileggi, Lawrence ^a   Strojwas, Andrzej J ^a   Motiani, Dipti ^b   Kheterpal, Veerbhan ^b   Tong, Kim Yaw ^a   Hersan, Thiago ^a   Pandini, Davide ^c  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b Fabbrix Inc   (United States)

^c STMICROELECTRONICS   (Italy)

Author keywords

Bricks; Design for manufacturability; Lithography friendly designs; Regular fabric; Regularity; Resolution enhancement technique compliant designs

Indexed keywords

BOOLEAN FUNCTIONS; LITHOGRAPHY; MANUFACTURE; PRODUCT DESIGN; STATIC RANDOM ACCESS STORAGE;

DESIGN FOR MANUFACTURABILITY; LITHOGRAPHY FRIENDLY DESIGNS; RESOLUTION-ENHANCEMENT-TECHNIQUE-COMPLIANT DESIGNS;

INTEGRATED CIRCUITS;

EID: 40049087126     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2781583     Document Type: Article

References (14)