Piezoresistive CMOS sensor for the localized measurement of five independent stress components

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2010, Pages 596-599

  Lemke, Benjamin ^a   Baskaran, Rajashree ^b   Paul, Oliver ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS SENSORS; HIGHLY INTEGRATED; IN-PLANE; IN-PLANE NORMAL STRESS; NORMAL STRESS; OUT-OF-PLANE SHEAR; PIEZO-RESISTIVE; PIEZORESISTANCE; SENSOR PERFORMANCE; STRESS COMPONENT; STRESS SENSOR; STRESS SPACE; TEMPERATURE CHANGES;

CMOS INTEGRATED CIRCUITS; EPOXY RESINS; MECHANICAL ENGINEERING; MECHANICS; REACTIVE ION ETCHING; RESINS; SHEAR STRESS; STRENGTH OF MATERIALS;

SENSORS;

EID: 77952782714     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2010.5442433     Document Type: Conference Paper

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