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Volumn 48, Issue 8 Part 1, 2009, Pages 0823021-0823025

Compositional transformation between Cu centers by annealing in Cu-diffused silicon crystals studied with deep-level transient spectroscopy and photoluminescence

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING BEHAVIOR; COMPOSITIONAL TRANSFORMATIONS; CONCENTRATION OF; CU ATOMS; DIFFUSED SILICON; DISSOCIATION PRODUCTS; ENERGY LEVEL; INTERMEDIATE SPECIE; ROOM TEMPERATURE; SI CRYSTALS; WEAK BOND;

EID: 77952732139     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.082302     Document Type: Article
Times cited : (9)

References (34)
  • 4
    • 0012051049 scopus 로고
    • ed. H. R. Huff, R. J. Krieger, and Y. Takeishi, Electrochemical Society, Pennington, NJ
    • K. Graff and H. Pieper: in Semiconductor Silicon 1981, ed. H. R. Huff, R. J. Krieger, and Y. Takeishi (Electrochemical Society, Pennington, NJ, 1981) p. 331.
    • (1981) Semiconductor Silicon 1981 , pp. 331
    • Graff, K.1    Pieper, H.2
  • 12
    • 0025669344 scopus 로고
    • ed. H. R. Huff, K. G. Barraclough, and J. Chikawa, Electrochemical Society, Pennington, NJ
    • P. Stallhofer, A. Huber, P. Blochl, and H. Schwenk: in Semiconductor Silicon 1990, ed. H. R. Huff, K. G. Barraclough, and J. Chikawa (Electrochemical Society, Pennington, NJ, 1990) p. 1016.
    • (1990) Semiconductor Silicon 1990 , pp. 1016
    • Stallhofer, P.1    Huber, A.2    Blochl, P.3    Schwenk, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.