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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 11, 2005, Pages 7760-7764

Molecular dynamics study of fast diffusion of Cu in silicon

(3) Shirai, Koun a Michikita, Toshiyuki a Katayama Yoshida, Hiroshi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Cu; Diffusion; Molecular dynamics simulation; Si

Indexed keywords

COMPUTER SIMULATION; COPPER; DATA ACQUISITION; DIFFUSION; IMPURITIES; MOLECULAR DYNAMICS;

COPPER IMPURITIES; MOLECULAR DYNAMICS SIMULATION;

SILICON;

EID: 31544449858 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.7760 Document Type: Article

Times cited : (26)

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