Argon-hydrogen rf plasma study for carbon film deposition

Journal of Physics D: Applied Physics

Volumn 37, Issue 18, 2004, Pages 2593-2606

  Laidani, N ^a   Bartali, R ^a   Tosi, P ^b   Anderle, M ^a  

^a ITC IRST   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ARGON; BINDING ENERGY; GLOW DISCHARGES; GRAPHITE ELECTRODES; HYDROGEN; IONS; SPUTTER DEPOSITION;

CARBON FILMS; ENERGY FLUX; GRAPHITE CATHODE; SURFACE LAYERS;

LANGMUIR BLODGETT FILMS;

EID: 4744359310     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/18/016     Document Type: Article

References (34)

1. Budtz-Jørgensen C V, Kringhøi P, Nielson J F and Bøttiger J 2002 Surf. Coat. Technol 135 299
2. Budtz-Jørgensen C V, Kringhøi P and Bøttiger J 1999 Surf. Coat. Technol. 116-119 938
3. Tsuij K and Hirokawa K 1991 Thin Solid Films 205 6
4. Popescu B, Verney C, Davis E A, Paret V and Brunet-Bruneau A 2000 J. Non-Cryst. Solids 266-9 778
5. Popescu B, Tagliaferro A, De Zan F and Davis E A 2000 J. Non-Cryst. Solids 266-9 803
6. Balden M and Roth J 2000 J. Nucl. Mater. 280 39
7. Davis J W 1997 J. Nucl. Mater. 241-243 37
8. Mech B V 1998 J. Nucl. Mater. 255 153
9. Kupers J 1995 Surf. Sci. Rep. 22 249
10. Hopf C, von Keudell A and Jacob W 2003 J. Appl. Phys. 94 2373
11. Bogaerts A and Gijbels R 2002 Spectrochim. Acta B 57 1071
12. Bogaerts A, Chen Z and Gijbels R 2003 Surf. Interface Anal. 35 593
13. Mills R L, Sankar J, Ray P, Voight A, He J and Dhandapani B 2004 J. Mater. Sci. 39 3309
14. Colthup N B, Daly L H and Wiberley S E 1969 Introduction to Infra-red and Roman Spectrosopies (New York: Academic)
15. Brodsky M H, Cardona M and Cuomo J J 1977 Phys. Rev. B 16 3556
16. Clements R M 1978 J. Vac. Sci. Technol. 15 193
17. Hopkins M B and Graham W G 1986 Rev. Sci. Instrum. 57 2210
18. Chapman B 1980 Plasmas Glow Discharges Processes (New York: Wiley)
19. Meulenbrocks R F G, van Beck A J, van Helvoort A J G, van de Sanden M C M and Schram D C 1994 Phys. Rev. E 49 4397
20. de Graaf M J, Severens R, Dahya R P, van de Sanden M C M and Schram D C 1993 Phys. Rev. E 48 2098
21. Mason R S, Miller P D and Mortimer IP 1997 Phys. Rev. E 55 7462
22. Hollmann E V, Pigarov A Yu and Frolov B 2003 30th EPS Conf. on Control. Fusion and Plasma Phys. (St Petersburg, 7-11 July 2003) vol 27A (EGA) p 3
23. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
24. Neyts E, Yan M, Bogaerts A and Gijbels R 2003 Nucl. Instrum. Methods B 202 300
25. Ricard A 1995 Reactive ionized media Reactive Plasmas 1st edn (Paris: SFV) pp 31-54
26. Mozetič M, Vesel A, Monna V and Ricard A 2003 Vacuum 71 201
27. Moxom J, Laricchia G and Chariten M 1995 J. Phys. B: At. Mol. Opt. Phys. 28 1331
28. Voronov G S 1997 At. Data Nucl. Data Tables 65 1
29. Biersack J P and Ziegler J F 2003 SRIM-2003
30. Jacob W 1998 Thin Solid Films 326 1
31. Weast R C and Astle M J (ed) 1978-79 CRC Handbook of Chemistry and Physics (West Palm Beach, FL: CRC Press)
32. Oehrlein S G 1990 Handbook of Plasma Processing Technology ed S M Rossnagel et al. (Park Bridge, NJ: Noyes Publications)
33. Kelly R 1984 Implantation, recoil implantation and sputtering Ion Bombardment Modification of Surfaces ed O Auciello and R Kelly (Amsterdam: Elsevier)
34. Postawa Z, Ludwig K, Piaskowy J, Krantzman K, Winograd N and Garrison B J 2003 Nucl. Instrum. Methods B 202 168