Effect of attaching gas addition on plasma parameters in inductive Ar/O2 and Ar/CF4 discharges

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 10, 2004, Pages 7240-7248

  Kimura, Takashi ^a   Takai, Tomoyoshi ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Argon; Carbon tetrafluoride; Electron energy distribution function; Global model; Inductive discharge; Oxygen

Indexed keywords

ARGON; CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRIC FIELD EFFECTS; ELECTRON ENERGY LEVELS; FLUORINE COMPOUNDS; OXYGEN; PLASMA ETCHING;

CARBON TETRAFLUORIDE; ELECTRON ENERGY DISTRIBUTION FUNCTION; GLOBAL MODEL; INDUCTIVE DISCHARGE;

INDUCTIVELY COUPLED PLASMA;

EID: 10844230318     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.7240     Document Type: Article

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