메뉴 건너뛰기




Volumn 15, Issue 1, 2009, Pages 3-6

Dielectric properties of the ion beam deposited SiOx doped DLC films

Author keywords

Dielectric properties; Doped diamond like carbon films; Ion beam synthesis; Siox

Indexed keywords


EID: 77952145049     PISSN: 13921320     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (3)

References (21)
  • 2
    • 0035248677 scopus 로고    scopus 로고
    • The Insulating Properties of a-C:H on Silicon and Metal Substrates
    • Maguire, P. D., Magill, D. P., Ogwu, A. A., McLaughlin, J. A. The Insulating Properties of a-C:H on Silicon and Metal Substrates Diam. Relat. Mater. 10 2001: pp. 216-223.
    • (2001) Diam. Relat. Mater , vol.10 , pp. 216-223
    • Maguire, P.D.1    Magill, D.P.2    Ogwu, A.A.3    McLaughlin, J.A.4
  • 3
    • 0035507851 scopus 로고    scopus 로고
    • From Tribological Coatings to Low-k Dielectrics for ULSI Interconnects
    • Grill, A. From Tribological Coatings to Low-k Dielectrics for ULSI Interconnects Thin Solid Films 398-399 2001: pp. 527-532.
    • (2001) Thin Solid Films , vol.398-399 , pp. 527-532
    • Grill, A.1
  • 4
    • 2942556941 scopus 로고    scopus 로고
    • Strong Field Charge Transport in MIS Structures Based on Low-K Carbon Films
    • Zuniga, C., Torres, A., Kosarev, A. Strong Field Charge Transport in MIS Structures Based on Low-K Carbon Films J. Non-Crystalline Solids 338-340 2004: pp. 326-330.
    • (2004) J. Non-Crystalline Solids , vol.338-340 , pp. 326-330
    • Zuniga, C.1    Torres, A.2    Kosarev, A.3
  • 5
    • 1542288019 scopus 로고    scopus 로고
    • High-density Plasma Chemical Vapor Deposition of Amorphous Carbon Films
    • Mousinho, A. P., Mansano, R. D., Verdonck, P. High-density Plasma Chemical Vapor Deposition of Amorphous Carbon Films Diam. Relat. Mater. 13 2004: pp. 311-315.
    • (2004) Diam. Relat. Mater , vol.13 , pp. 311-315
    • Mousinho, A.P.1    Mansano, R.D.2    Verdonck, P.3
  • 6
    • 20244365288 scopus 로고    scopus 로고
    • Electron Injection Enhancement by Diamond-like Carbon Film in Organic Electroluminescence Devices
    • Dong Won Han, Soon Moon Jeong, Hong Koo Baik, Se Jong Lee, Nam Choul Yang, Dong Hack Suh. Electron Injection Enhancement by Diamond-like Carbon Film in Organic Electroluminescence Devices Thin Solid Films 420-421 2002: pp. 190-194.
    • (2002) Thin Solid Films , vol.420-421 , pp. 190-194
    • Han, D.W.1    Jeong, S.M.2    Baik, H.K.3    Se, J.L.4    Yang, N.C.5    Suh, D.H.6
  • 8
    • 0037851425 scopus 로고    scopus 로고
    • Effects of SiOx -Incorporation Hydrocarbons on the Tribological Properties of DLC films
    • Chen, Liang-Yih, Chau-Nan Hong, Franklin. Effects of SiOx -Incorporation Hydrocarbons on the Tribological Properties of DLC films Diamond Relat. Mater. 10 2001: pp. 1058-1062.
    • (2001) Diamond Relat. Mater , vol.10 , pp. 1058-1062
    • Chen, L.-Y.1    Hong, C.-N.2    Franklin3
  • 11
    • 0037083751 scopus 로고    scopus 로고
    • Temperature Dependence of Mechanical Properties of DLC/Si Protective Coatings Prepared by PECVD
    • Bursikova, V., Navratil, V., Zajickova, L., Janca, J. Temperature Dependence of Mechanical Properties of DLC/Si Protective Coatings Prepared by PECVD Mater. Sci. Eng. A 324 2002: pp. 251-254.
    • (2002) Mater. Sci. Eng. A , vol.324 , pp. 251-254
    • Bursikova, V.1    Navratil, V.2    Zajickova, L.3    Janca, J.4
  • 13
    • 31644451390 scopus 로고    scopus 로고
    • Effect of Deposition Temperature and Oxygen Flow Rate on Properties of Low Dielectric Constant SiCOH Film Prepared by Plasma Enhanced Chemical Vapor Deposition Using Diethoxymethylsilane
    • Cheng, Y. L., Wang, Y. L., Hwang, G. J., O'Neill, M. L., Karwacki, E. J., Liu, P. T., Chen, C. F. Effect of Deposition Temperature and Oxygen Flow Rate on Properties of Low Dielectric Constant SiCOH Film Prepared by Plasma Enhanced Chemical Vapor Deposition Using Diethoxymethylsilane Surf. Coat. Technol. 200 2006: pp. 3134-3139.
    • (2006) Surf. Coat. Technol , vol.200 , pp. 3134-3139
    • Cheng, Y.L.1    Wang, Y.L.2    Hwang, G.J.3    O'Neill, M.L.4    Karwacki, E.J.5    Liu, P.T.6    Chen, C.F.7
  • 14
    • 28044455877 scopus 로고    scopus 로고
    • Impact of Patterning and Ashing on Electrical Properties and Reliability of Interconnects in a Porous SiOCH Ultra Low-k Dielectric Material
    • Aimadeddine, M., Arnal, V., Farcy, A. et al. Impact of Patterning and Ashing on Electrical Properties and Reliability of Interconnects in a Porous SiOCH Ultra Low-k Dielectric Material Microelectronic Engineering 82 2005: pp. 341-347.
    • (2005) Microelectronic Engineering , vol.82 , pp. 341-347
    • Aimadeddine, M.1    Arnal, V.2    Farcy, A.3
  • 16
    • 33747892750 scopus 로고    scopus 로고
    • Multiphase Structure of Hydrogen Diluted a-SiC:H Deposited by HWCVD
    • Swain, B. P., Dusane, R. O. Multiphase Structure of Hydrogen Diluted a-SiC:H Deposited by HWCVD Mater. Chem. Phys. 99 2006: pp. 240-246.
    • (2006) Mater. Chem. Phys , vol.99 , pp. 240-246
    • Swain, B.P.1    Dusane, R.O.2
  • 17
    • 0026867491 scopus 로고
    • Diamond-like Nanocomposites (DLN)
    • Dorfman, V. F. Diamond-like Nanocomposites (DLN) Thin Solid Films 212 1992: pp. 267-273.
    • (1992) Thin Solid Films , vol.212 , pp. 267-273
    • Dorfman, V.F.1
  • 20
    • 0032083901 scopus 로고    scopus 로고
    • Investigation of the Intrinsic SiO 2Area Dependence Using TDDB Testing and Model Integration into the Design Process
    • Prendergast, J., Foley, N., Suehle, J. S. Investigation of the Intrinsic SiO 2Area Dependence Using TDDB Testing and Model Integration into the Design Process Microelectronics Reliability 38 1998: pp. 1121-1125.
    • (1998) Microelectronics Reliability , vol.38 , pp. 1121-1125
    • Prendergast, J.1    Foley, N.2    Suehle, J.S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.