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Volumn , Issue 15, 2009, Pages 1978-1980
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Hafnium carbamates and ureates: New class of precursors for low-temperature growth of HfO2 thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
CARBAMIC ACID DERIVATIVE;
HAFNIUM;
HAFNIUM DIOXIDE;
HAFNIUM ETHYLMETHYLAMIDE;
HAFNIUM ISOPROPOXIDE;
ISOCYANIC ACID DERIVATIVE;
UNCLASSIFIED DRUG;
UREA;
ARTICLE;
CRYSTAL STRUCTURE;
FILM;
LOW TEMPERATURE;
STOICHIOMETRY;
TEMPERATURE DEPENDENCE;
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EID: 63849261284
PISSN: 13597345
EISSN: None
Source Type: Journal
DOI: 10.1039/b821128k Document Type: Article |
Times cited : (17)
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References (23)
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