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Journal of Materials Chemistry

Volumn 16, Issue 5, 2006, Pages 437-440

Mixed amide-malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films

(7) Milanov, A a Bhakta, R a Thomas, R b Ehrhart, P b Winter, M a Waser, R b Devi, A a

a RUHR UNIVERSITY BOCHUM (Germany)

b FORSCHUNGSZENTRUM JÜLICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; ESTERS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC SOLVENTS; THERMAL EFFECTS; THIN FILMS;

AMIDE-MALONATE COMPOUND; INJECTION SYSTEMS; LIGANDS; LIQUID INJECTION;

HAFNIUM COMPOUNDS;

EID: 33644692956 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b509380e Document Type: Article

Times cited : (18)

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