LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9109-9116

  Milanov, Andrian ^a   Thomas, Reji ^b   Hellwig, Malte ^a   Merz, Klaus ^a   Becker, Hans Werner ^a   Ehrhart, Peter ^b   Fischer, Roland A ^a   Waser, Rainer ^b   Devi, Anjana ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

High k oxides metalorganic precursors; LI MOCVD; Malonates; Thin films

Indexed keywords

CHARACTERIZATION; HAFNIUM COMPOUNDS; MASS SPECTROMETRY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SURFACE ROUGHNESS; THERMODYNAMIC PROPERTIES; THIN FILMS; X RAY ANALYSIS;

FILMS DEPOSITION; HAFNIUM PRECURSORS; HIGH-K OXIDES METALORGANIC PRECURSORS; LIQUID INJECTION METALORGANIC CHEMCIAL VAPOR DEPOSITION (LI-MOCVD); MALONATES;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

CHARACTERIZATION; HAFNIUM COMPOUNDS; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SURFACE ROUGHNESS; THERMODYNAMIC PROPERTIES; THIN FILMS; X RAY ANALYSIS;

EID: 34547678614     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.055     Document Type: Article

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