Characterization of ZnO thin films grown on various substrates by RF magnetron sputtering

Applied Surface Science

Volumn 256, Issue 13, 2010, Pages 4241-4245

  Lee, Kyu Hang ^a   Cho, Nam In ^a   Yun, Eui Jung ^b   Nam, H G ^a  

^a SunMoon University   (South Korea)

^b Hoseo University   (South Korea)

Author keywords

Conductivity; Hydrogen desorption; RF magnetron sputtering; ZnO

Indexed keywords

BINDING ENERGY; DESORPTION; ELECTRIC CONDUCTIVITY; FILM PREPARATION; II-VI SEMICONDUCTORS; INDIUM COMPOUNDS; ITO GLASS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OXYGEN; SEMICONDUCTING FILMS; SUBSTRATES; TIN OXIDES; ZINC OXIDE;

CRYSTALLINITIES; DEGREE OF CRYSTALLIZATION; HYDROGEN DESORPTION; INDIUM TIN OXIDE; OXYGEN CONTENT; P TYPE CONDUCTIVITY; RF-MAGNETRON SPUTTERING; VARIOUS SUBSTRATES;

THIN FILMS;

EID: 77950688996     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.009     Document Type: Article

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