Quenching of electron temperature and electron density in ionized physical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 2, 1997, Pages 340-344

  Dickson, M ^a   Qian, F ^a   Hopwood, J ^a  

^a Northeastern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031519720     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580489     Document Type: Article

References (18)

1. Y. Homma and S. Tsunekawa, J. Electrochem. Soc. 132, 1466 (1985).
2. N. Motegi, Y. Kashimoto, K. Nagatani, S. Takahashi, T. Kondo, Y. Mizusawa, and I. Nakayama, J. Vac. Sci. Technol. B 13, 1906 (1995).
3. S. M. Rossnagel, D. Mikalsen, H. Kinsohita, and J. J. Cuomo, J. Vac. Sci. Technol. A 9, 261 (1991).
4. P. Singer, Semicond. Int. 19, 89 (1996), and references therein.
5. W. M. Holber, J. S. Logan, J. J. Grabarz, J. T. C. Yeh, J. B. O. Caughman, A. Sugerman, and F. E. Turene, J. Vac. Sci. Technol. A 11, 2903 (1993).
6. S. M. Rossnagel, J. Vac. Sci. Technol. B 13, 125 (1995).
7. M. Yamashita, J. Vac. Sci. Technol. A 7, 151 (1989).
8. S. M. Rossnagel and J. Hopwood, J. Vac. Sci. Technol. B 12, 449 (1994).
9. J. Hopwood and F. Qian, J. Appl. Phys. 78, 758 (1995).
10. C. Lee and M. A. Lieberman, J. Vac. Sci. Technol. A 13, 368 (1995).
11. L. Vriens, Phys. Lett. 8, 260 (1964).
12. D. Rapp and P. Englander-Golden, J. Chem. Phys. 43, 1464 (1965).
13. L. L. Shimon, E. I. Nepiipov, and I. P. Zapesochnyi, Sov. Phys. Tech. Phys. 20, 434 (1975).
14. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), p. 304.
15. V. A. Godyak, Soviet Radio Frequency Discharge Research (Delphic, Falls Church, VA, 1986), p. 79.
16. S. M. Rossnagel, J. Vac. Sci. Technol. A 6, 19 (1988).
17. G. M. Turner, J. Vac. Sci. Technol. A 13, 2161 (1995).
18. A. Gras-Marti and J. A. Valles-Abarca, J. Appl. Phys. 52, 1071 (1983).