Probing the strain states in nanopatterned strained SOI

ECS Transactions

Volumn 25, Issue 3, 2009, Pages 187-194

  Moutanabbir, O ^a   Reiche, M ^b   Hahnel A ^a   Erfurth, W ^a   Naumann, F ^b   Petzold, M ^b   Gosele U ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Fraunhofer for Mechanics of Materials   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; NANOSTRUCTURES; SEMICONDUCTOR MATERIALS; SILICON COMPOUNDS; URANIUM METALLOGRAPHY; VANADIUM METALLOGRAPHY;

3D FINITE-ELEMENT SIMULATION; DEVICE FABRICATIONS; ELECTRONIC DEVICE; FREE SURFACES; LATERAL DIMENSION; PROCESSING STEPS; STRAIN STATE; STRAINED LAYERS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 77649195726     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3204406     Document Type: Conference Paper

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