Optimization of the electrical properties of magnetron sputtered aluminum-doped zinc oxide films for opto-electronic applications

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 167-172

  Agashe, Chitra ^a   Kluth, Oliver ^a   Schöpe, Gunnar ^a   Siekmann, Hilde ^a   Hüpkes, Jürgen ^a   Rech, Bernd ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Electrical properties and measurements; Optoelectronic devices; Sputtering; Zinc oxide

Indexed keywords

ABSORPTION; ALUMINUM; CONDUCTIVE FILMS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTRODES; MAGNETRON SPUTTERING; OPTOELECTRONIC DEVICES; ZINC OXIDE;

TARGET DOPING CONCENTRATIONS;

THIN FILMS;

EID: 0141636270     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00966-0     Document Type: Conference Paper

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