Removal of ion-implanted photoresists using atomic hydrogen

Journal of the Electrochemical Society

Volumn 157, Issue 3, 2010, Pages

  Yamamoto, Masashi ^a   Maruoka, Takeshi ^a   Goto, Yousuke ^a   Kono, Akihiko ^a   Horibe, Hideo ^a   Sakamoto, Mune Aki ^a   Kusano, Eiji ^a   Seki, Hirofumi ^b   Tagawa, Seiichi ^c  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b TORAY RESEARCH CENTER INC   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION ENERGY; ATOMIC HYDROGEN; CONJUGATED SYSTEMS; CROSS-LINKAGE; HARDENED LAYERS; HARDENING MECHANISM; ION SPECIES; NOVOLAK; PHOTORESIST SURFACES; POSITIVE-TONE; REMOVAL RATE; IMPLANTATION DOSE; PI-CONJUGATED SYSTEM; REMOVAL CHARACTERISTICS;

CARBONIZATION; HARDENING; IONS; PHOTORESISTORS; SURFACE TREATMENT; ATOMS; HYDROGEN; ION IMPLANTATION;

PHOTORESISTS;

EID: 76349122241     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3288697     Document Type: Article

References (41)

1. S. Fujimura, J. Konno, K. Hikazutani, and H. Yano, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922, 28, 2130 (1989). 10.1143/JJAP.28.2130
2. P. M. VisintM. B. Korzenshi, and T. H. Baum, J. Electrochem. Soc. JESOAN 0013-4651, 153, G591 (2006). 10.1149/1.2195884 (Pubitemid 43838710)
3. K. K. Ong, M. H. Liang, L. H. Chan, and C. P. Soo, J. Vac. Sci. Technol. A JVTAD6 0734-2101, 17, 1479 (1999). 10.1116/1.581839
4. M. N. Kawaguchi, J. S. Papanu, and E. G. Pavel, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 24, 651 (2006). 10.1116/1.2178366
5. J. I. McOmber and R. S. Nair, Nucl. Instrum. Methods Phys. Res. B NIMBEU 0168-583X, 55, 281 (1991). 10.1016/0168-583X(91)96178-N
6. Y. Okuyama, T. Hashimoto, and T. Koguchi, J. Electrochem. Soc. JESOAN 0013-4651, 125, 1293 (1978). 10.1149/1.2131665
7. J. J. Lee, C. O. Lee, J. Alvis, and S. W. Sun, J. Electrochem. Soc. JESOAN 0013-4651, 135, 711 (1988). 10.1149/1.2095728
8. M. N. Kawaguchi, J. S. Papanu, B. Su, M. Castle, and A. Al-Bayati, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 24, 657 (2006). 10.1116/1.2178367
9. H. Horibe, M. Yamamoto, T. Ichikawa, T. Kamimura, and S. Tagawa, J. Photopolym. Sci. Technol. JSTEEW 0914-9244, 20, 315 (2007). 10.2494/ photopolymer.20.315
10. T. Miura, M. Kekura, H. Horibe, and M. Yamamoto, J. Photopolym. Sci. Technol. JSTEEW 0914-9244, 21, 311 (2008). 10.2494/photopolymer.21.311
11. T. Maruoka, Y. Goto, M. Yamamoto, H. Horibe, E. Kusano, K. Takao, and S. Tagawa, J. Photopolym. Sci. Technol. JSTEEW 0914-9244, 22, 325 (2009). 10.2494/photopolymer.22.325
12. M. Yamamoto, Y. Goto, T. Maruoka, H. Horibe, T. Miura, E. Kusano, and S. Tagawa, J. Electrochem. Soc. JESOAN 0013-4651, 156, H505 (2009). 10.1149/1.3121583
13. J. N. Smith, Jr. and W. L. Fite, J. Chem. Phys. JCPSA6 0021-9606, 37, 898 (1962). 10.1063/1.1733181
14. T. W. Hickmott, J. Chem. Phys. JCPSA6 0021-9606, 32, 810 (1960). 10.1063/1.1730802
15. K. Hashimoto, A. Masuda, H. Matsumura, T. Ishibashi, and K. Takao, Thin Solid Films THSFAP 0040-6090, 501, 326 (2006). 10.1016/j.tsf.2005.07.287 (Pubitemid 43243030)
16. M. Takata, K. Ogushi, Y. Yuba, Y. Akasaka, K. Tomioka, E. Soda, and N. Kobayashi, Thin Solid Films THSFAP 0040-6090, 516, 847 (2008). 10.1016/j.tsf.2007.06.206 (Pubitemid 350213007)
17. H. Horibe, M. Yamamoto, E. Kusano, T. Ichikawa, and S. Tagawa, J. Photopolym. Sci. Technol. JSTEEW 0914-9244, 21, 293 (2008). 10.2494/ photopolymer.21.293
18. M. Yamamoto, H. Horibe, H. Umemoto, K. Takao, E. Kusano, M. Kase, and S. Tagawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922, 48, 026503 (2009). 10.1143/JJAP.48.026503
19. A. Izumi and H. Matsumura, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922, 41, 4639 (2002). 10.1143/JJAP.41.4639
20. J. I. Pankove and N. M. Johnson, Hydrogen in Semiconductors, Vol. 34, Academic, San Diego (1991).
21. R. Z. Bachrach and R. D. Bringans, J. Vac. Sci. Technol. B JVTBD9 1071-1023, 1, 142 (1983). 10.1116/1.582517
22. A. Heya, A. Masuda, and H. Matsumura, Appl. Phys. Lett. APPLAB 0003-6951, 74, 2143 (1999). 10.1063/1.123782
23. T. Sugaya and M. Kawabe, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922, 30, L402 (1991). 10.1143/JJAP.30.L402
24. K. Uchida, A. Izumi, and H. Matsumura, Thin Solid Films THSFAP 0040-6090, 395, 75 (2001). 10.1016/S0040-6090(01)01211-1 (Pubitemid 32933873)
25. H. Oizumi, A. Izumi, K. Motai, I. Nishiyama, and A. Namiki, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922, 46, L633 (2007). 10.1143/JJAP.46.L633 (Pubitemid 47245278)
26. W. C. Oliver and G. M. Pharr, J. Mater. Res. JMREEE 0884-2914, 7, 1564 (1992). 10.1557/JMR.1992.1564
27. M. Lichinchi, C. Lenardi, J. Haupt, and R. Vitali, Thin Solid Films THSFAP 0040-6090, 312, 240 (1998). 10.1016/S0040-6090(97)00739-6
28. X. Chen and J. J. Vlassaka, J. Mater. Res. JMREEE 0884-2914, 16, 2974 (2001). 10.1557/JMR.2001.0408
29. B. D. Beake, G. J. Leggett, and M. R. Alexander, J. Mater. Sci. JMTSAS 0022-2461, 37, 4919 (2002). 10.1023/A:1020830717653
30. G. M. Pharr, W. C. Oliver, and F. R. Brotzen, J. Mater. Res. JMREEE 0884-2914, 7, 613 (1992). 10.1557/JMR.1992.0613
31. J. F. Ziegler, J. P. Biersack, and M. D. Ziegler, SRIM "The Stopping and Range of Ions in Matter," Lulu, Morrisville, NC (2008) (http://www.srim.org).
32. T. C. Smith, in Handbook of Ion Implantation Technology, J. F. Ziegler, Editor, Elsevier Science, New York (1992).
33. H. Umemoto, K. Ohara, D. Morita, T. Morimoto, M. Yamawaki, A. Masuda, and H. Matsumura, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922, 42, 5315 (2003). 10.1143/JJAP.42.5315
34. H. Umemoto, K. Ohara, D. Morita, Y. Nozaki, A. Masuda, and H. Matsumura, J. Appl. Phys. JAPIAU 0021-8979, 91, 1650 (2002). 10.1063/1.1428800 (Pubitemid 34148847)
35. T. Ishibashi, S. Shimoda, T. Furukawa, I. Nitta, and H. Yoshida, Trans. Jpn. Soc. Mech. Eng. NKGRAO 0375-9466, 53, 2193 (2007).
36. J. Xu, J. Y. Rho, S. R. Mishra, and Z. Fan, J. Biomed. Mater. Res. Part A ZZZZZZ 1549-3296, 67A, 719 (2003). 10.1002/jbm.a.10109
37. G. M. Pharr, W. C. Oliver, and F. R. Brotzen, Mater. Sci. Eng., A MSAPE3 0921-5093, 445-446, 323 (2007).
38. Y. J. Zou, X. W. Zhang, Y. L. Li, B. Wang, H. Yan, J. Z. Cui, L. M. Liu, and D. A. Da, J. Mater. Sci. JMTSAS 0022-2461, 37, 1043 (2002). 10.1023/A:1014368418784 (Pubitemid 34269087)
39. G. D. Sorar, N. Dallabona, C. Gervais, and F. Babonneau, Chem. Mater. CMATEX 0897-4756, 11, 910 (1999). 10.1021/cm980353l
40. A. Annen, M. Sass, R. Beckmann, A. Von Keudell, and W. Jacob, Thin Solid Films THSFAP 0040-6090, 312, 147 (1998). 10.1016/S0040-6090(97)00735-9
41. N. Nagai, T. Imai, K. Terada, H. Seki, H. Okumura, H. Fujino, T. Yamamoto, I. Nishiyama, and A. Hatta, Surf. Interface Anal. SIANDQ 0142-2421, 33, 545 (2002). 10.1002/sia.1415 (Pubitemid 34789929)