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Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 147-155

Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films

(5) Annen, A a Sass M a Beckmann, R a Von Keudell, A a Jacob, W a

a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK (Germany)

Author keywords

Boron carbon thin films; Ion beam analysis; Plasma deposition

Indexed keywords

CARBON; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; MOLECULAR VIBRATIONS; PLASMA APPLICATIONS; SEMICONDUCTING BORON; THIN FILMS;

BORON CARBON THIN FILMS; ION BEAM ANALYSIS;

AMORPHOUS FILMS;

EID: 0031700722 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00735-9 Document Type: Article

Times cited : (33)

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