Low-temperature crystallization of amorphous silicon using atomic hydrogen generated by catalytic reaction on heated tungsten

Applied Physics Letters

Volumn 74, Issue 15, 1999, Pages 2143-2145

  Heya, Akira ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CATALYTIC CRACKING; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; CRYSTALLIZATION; RAMAN SCATTERING; RAMAN SPECTROSCOPY;

ATOMIC HYDROGEN ANNEAL (AHA) METHODS;

AMORPHOUS FILMS;

EID: 0032622106     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123782     Document Type: Article

References (9)

1. J.-H. Zhou, K. Ikuta, T. Yasuda, T. Umeda, S. Yamasaki, and K. Tanaka, J. Non-Cryst. Solids 227-230, 857 (1998).
2. H. Matsumura and H. Tachibana, Appl. Phys. Lett. 47, 833 (1985).
3. H. Matsumura, J. Appl. Phys. 66, 3612 (1989).
4. A. Izumi and H. Matsumura, Appl. Phys. Lett. 71, 1371 (1997).
5. H. Matsumura, Jpn. J. Appl. Phys., Part 2 30, L1522 (1991).
6. H. Matsumura, Jpn. J. Appl. Phys., Part 1 37, 3175 (1998).
7. A. Masuda, R. Iiduka, A. Heya, C. Niikura, and H. Matsumura, J. Non-Cryst. Solids 227-230, 987 (1998).
8. K. Saitoh, M. Kondo, M. Fukawa, T. Nishimiya, A. Matsuda, W. Futako, and I. Shimizu, Appl. Phys. Lett. 71, 3403 (1997).
9. A. Heya, K. Nakata, A. Izumi, and H. Matsumura, Mater. Res. Soc. Symp. Proc. (in press).