Resist removal by using atomic hydrogen

Journal of Photopolymer Science and Technology

Volumn 21, Issue 2, 2008, Pages 293-298

  Horibe, Hideo ^a,c   Yamamoto, Masashi ^a   Kusano, Eiji ^a   Ichikawa, Tomokazu ^b   Tagawa, Seiichi ^c  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

Author keywords

Atomic hydrogen; Benzene ring; Resist removal; W catalyzer

Indexed keywords

EID: 49749118820     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.293     Document Type: Article

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