Systematic study on photoresist removal using hydrogen atoms generated on heated catalyzer

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 326-328

  Hashimoto, Kouhei ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a   Ishibashi, Tomoatsu ^b   Takao, Kazuhisa ^b  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

Catalyzer; Hydrogen; Photoresist removal; Plasmaless process

Indexed keywords

OXYGEN; PHOTORESISTS; SEMICONDUCTOR DEVICES; SUBSTRATES; THERMAL EFFECTS;

CATALYZER; PHOTORESIST REMOVAL; PLASMALESS PROCESS;

CATALYSIS;

EID: 32644444560     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.287     Document Type: Conference Paper

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