Photoresist removal process by hydrogen radicals generated by W catalyst

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 847-849

  Takata, M ^a   Ogushi, K ^a   Yuba, Y ^a   Akasaka, Y ^a   Tomioka, K ^b   Soda, E ^b   Kobayashi, N ^b  

^a OSAKA UNIVERSITY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Catalyst; Hydrogen radical; Low k; Photoresist

Indexed keywords

CATALYST ACTIVITY; DIELECTRIC MATERIALS; POROUS MATERIALS; REMOVAL;

HYDROGEN RADICALS; POROUS METHYLSILSESQUIOXANE (P-MSQ);

PHOTORESISTS;

EID: 36749079849     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.206     Document Type: Article

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