Low temperature, ion-enhanced, implanted photoresist removal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 651-656

  Kawaguchi, Mark N ^a   Papanu, James S ^a   Pavel, Elizabeth G ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN-DEVOID CRUST; OPTICAL EMISSION; OXYGEN PLASMA;

HYDROGEN; ION IMPLANTATION; OXYGEN; PLASMA WAVES; SCANNING ELECTRON MICROSCOPY;

PHOTORESISTS;

EID: 33645514972     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2178366     Document Type: Article

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