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Surface and Coatings Technology

Volumn 204, Issue 11, 2010, Pages 1863-1867

Effect of nitrogen pressure on structure and optical properties of pulsed laser deposited BCN thin films

(6) Yang, Q a Wang, C B a Zhang, S a Zhang, D M a Shen, Q a Zhang, L M a

a WUHAN UNIVERSITY OF TECHNOLOGY (China)

Author keywords

BCN thin films; Optical properties; Pulsed laser deposition; Structure

Indexed keywords

AMORPHOUS BORON; BCN COMPOUNDS; BCN FILMS; BCN THIN FILMS; BONDING STATE; FILM COMPOSITION; FILM DEPOSITION RATES; FTIR; NITROGEN ATMOSPHERES; NITROGEN CONTENT; NITROGEN PRESSURE; PULSED LASER; QUARTZ SUBSTRATE; SI(1 0 0); SURFACE PROFILERS; XPS ANALYSIS;

ABLATION; AMORPHOUS CARBON; AMORPHOUS FILMS; AMORPHOUS SILICON; BOND STRENGTH (CHEMICAL); BORON; BORON CARBIDE; BORON NITRIDE; CARBON FILMS; CHEMICAL COMPOUNDS; DEPOSITION; DEPOSITION RATES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDES; NITROGEN; OPTICAL PROPERTIES; OXIDE MINERALS; PRESSURE EFFECTS; PULSED LASER DEPOSITION; PULSED LASERS; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; STRUCTURAL PROPERTIES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL FILMS;

EID: 74849137725 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.11.033 Document Type: Article

Times cited : (47)

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