Structural and chemical analysis of amorphous B-N-C thin films deposited by RF sputtering

Diamond and Related Materials

Volumn 14, Issue 10, 2005, Pages 1663-1668

  Essafti, A ^a   Ech Chamikh, E ^a   Fierro, J L G ^b  

^a FACULTÉ DES SCIENCES SEMLALIA   (Morocco)

^b INSTITUTO DE CATÁLISIS Y PETROLEOQUÍMICA   (Spain)

Author keywords

Amorphous films; B N C system; Boron nitride; RF sputtering

Indexed keywords

BORON; CARBON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MIXTURES; NITROGEN; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

B-N-C SYSTEM; BORON NITRIDE; FILM DEPOSITION; GAS MIXTURES; REACTIVE RADIO FREQUENCY SPUTTERING; RF SPUTTERING;

AMORPHOUS FILMS;

EID: 24144480916     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.06.005     Document Type: Article

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