Electrochemical properties of boron-carbon-nitride films formed by magnetron sputtering

Electrochimica Acta

Volumn 51, Issue 13, 2006, Pages 2662-2668

  Byon, Eungsun ^a   Son, Myungsook ^b   Lee, Koo Hyun ^a   Nam, Kee Seok ^a   Hara, Nobuyoshi ^c   Sugimoto, Katsuhisa ^c  

^a Korea Institute of Machine and Materials   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

Boron carbon nitride films; Chemical composition; Electrochemical properties; Magnetron sputtering

Indexed keywords

ANODIC POLARIZATION; BORON; CARBON; COMPOSITION; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; NITRIDES;

BORON-CARBON-NITRIDE FILMS; CATHODIC POLARIZATION; ELECTROCHEMICAL PROPERTIES;

THIN FILMS;

EID: 33244493078     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.08.006     Document Type: Article

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