Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9009-9014

  Sulyaeva, V S ^a   Rumyantsev, Yu M ^a   Kosinova, M L ^a   Golubenko, A N ^a   Fainer, N I ^a   Kuznetsov, F A ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

81.15.Gh; 82.60. s; BCxNy films; N trimethylborazine; Optical properties; PECVD; Thermodynamic simulation

Indexed keywords

BORON COMPOUNDS; OPTICAL PROPERTIES; PRESSURE; STRUCTURE (COMPOSITION); SUBSTRATES; THERMAL EFFECTS; THERMODYNAMICS; THIN FILMS;

CHEMICAL COMPOSITION; THERMODYNAMIC SIMULATION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

BORON COMPOUNDS; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE; STRUCTURE (COMPOSITION); SUBSTRATES; THERMAL EFFECTS; THERMODYNAMICS; THIN FILMS;

EID: 34547735965     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.016     Document Type: Article

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