Chemical character of BCxNy layers grown by CVD with trimethylamine borane

X-Ray Spectrometry

Volumn 38, Issue 1, 2009, Pages 68-73

  Baake, O ^b   Hoffmann, P S ^a   Klein, A ^a   Pollakowski, B ^b   Beckhoff, B ^b   Enslnger, W ^a   Kosinova, M ^c   Falner, N ^c   Sylyaewa, V S ^c   Trunova, V ^c  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; SILICON WAFERS; SYNCHROTRON RADIATION; X RAY ABSORPTION; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION PROCESS; CHEMICAL VAPOUR DEPOSITION; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; SI(1 0 0); TOTAL REFLECTION X-RAY FLUORESCENCE; TRIMETHYL AMINE; X RAY FLUORESCENCE ANALYSIS;

FLUORESCENCE;

EID: 59849124643     PISSN: 00498246     EISSN: 10974539     Source Type: Journal    
DOI: 10.1002/xrs.1117     Document Type: Article

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