Variation of carbon concentration, ion energy, and ion current density of magnetron-sputtered boron carbonitride films

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 742-750

  Ulrich, S ^a   Kratzsch, A ^a   Leiste, H ^a   Stuber M ^a   Schlossmacher P ^a   Holleck, H ^a   Binder, J ^a   Schild, D ^a   Westermeyer, S ^b   Becker, P ^b   Oechsner, H ^b  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b D 67663   (Germany)

Author keywords

B C N; Boron carbonitride films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BORON COMPOUNDS; CHEMICAL BONDS; COMPOSITION EFFECTS; CURRENT DENSITY; INFRARED SPECTROSCOPY; ION BOMBARDMENT; MAGNETRON SPUTTERING;

BORON CABONITRIDE FILMS;

SPUTTER DEPOSITION;

EID: 0033311620     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00353-9     Document Type: Article

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