Characterization of microscale wear in a polysilicon-based MEMS device using AFM and PEEM-NEXAFS spectromicroscopy

Tribology Letters

Volumn 36, Issue 3, 2009, Pages 233-238

  Grierson, D S ^a   Konicek, A R ^b   Wabiszewski, G E ^c   Sumant, A V ^d   De Boer, M P ^e   Corwin, A D ^e   Carpick, R W ^c  

^a University of Wisconsin Madison   (United States)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

^c UNIVERSITY OF PENNSYLVANIA   (United States)

^d ARGONNE NATIONAL LABORATORY   (United States)

^e SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Atomic force microscopy (AFM); Microelectromechanical systems (MEMS); Microscale wear; Nanotractor; Photoelectron emission microscopy (PEEM)

Indexed keywords

AFM; CHEMICAL CHANGE; CHEMICAL VARIATIONS; CONTACT INTERFACE; CONTROLLED CONDITIONS; FRICTION AND WEAR; MEMSDEVICES; MICRO-SCALES; MICROELECTROMECHANICAL SYSTEMS; NANOTRACTORS; NEAR SURFACE REGIONS; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; PHOTOELECTRON EMISSION MICROSCOPY; SEM; SILICON-BASED MICROELECTROMECHANICAL SYSTEMS; SLIDING INTERFACES; SPATIAL RESOLUTION; SPECTROMICROSCOPY; STRUCTURAL MODIFICATIONS; WEAR TRACKS;

ABSORPTION SPECTROSCOPY; AIRCRAFT PARTS AND EQUIPMENT; ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL MODIFICATION; COMPOSITE MICROMECHANICS; CRYSTAL ATOMIC STRUCTURE; DEBRIS; ELECTRONS; MECHATRONICS; MEMS; MICROACTUATORS; MICROELECTROMECHANICAL DEVICES; OXIDATION; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; POLYSILICON; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; WEAR OF MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY;

EID: 72849124518     PISSN: 10238883     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11249-009-9478-7     Document Type: Article

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