Tribochemistry and material transfer for the ultrananocrystalline diamond-silicon nitride interface revealed by x-ray photoelectron emission spectromicroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 5, 2007, Pages 1700-1705

  Grierson, David S ^a   Sumant, Anirudha V ^a,c   Konicek, Andrew R ^a   Abrecht, Mike ^b   Birrell, J ^c   Auciello, Orlando ^c   Carlisle, John A ^c,e   Scharf, Thomas W ^d,f   Dugger, Michael T ^d   Gilbert, P U P A ^a   Carpick, Robert W ^a,g  

^a University of Wisconsin Madison

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

^e ADVANCED DIAMOND TECHNOLOGIES INC   (United States)

^f UNIVERSITY OF NORTH TEXAS   (United States)

^g UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOCRYSTALLINE MATERIALS; SILICON NITRIDE; THIN FILMS; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

MATERIAL TRANSFER; REHYBRIDIZATION; SLIDING WEAR MEASUREMENTS; TRIBOCHEMISTRY;

DIAMONDS;

EID: 34648818190     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2782428     Document Type: Article

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