Spectroscopic ellipsometry characterization of amorphous carbon and amorphous, graphitic and fullerene-like carbon nitride thin films

Thin Solid Films

Volumn 517, Issue 24, 2009, Pages 6652-6658

  Berlind, T ^a   Furlan, A ^a   Czigany, Zs ^b   Neidhardt, J ^a   Hultman, L ^a   Arwin, H ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

Amorphous carbon; Carbon nitride; Fullerene like; Spectral decomposition; Spectroscopic ellipsometry; Structural properties; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS CARBON (A-C); AS-DEPOSITED FILMS; BONDING STRUCTURE; C-C BONDS; CONTROLLED CONDITIONS; ELECTRONIC TRANSITION; ELLIPSOMETRIC SPECTRA; FULLERENE-LIKE CARBON NITRIDE; FULLERENE-LIKE MICROSTRUCTURES; IR SPECTRAL RANGE; NITROGEN-CONTAINING FILMS; OPTICAL SPECTRA; REACTIVE MAGNETRON SPUTTERING; SPECTRAL DECOMPOSITION; UV-VIS-NIR;

AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBON FILMS; CARBON NITRIDE; CYANIDES; ELECTRON MICROSCOPY; ELECTRONS; FULLERENES; GRAPHITE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; PYRIDINE; RESONANCE; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON;

EID: 71749090683     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.04.065     Document Type: Article

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