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Volumn 10, Issue 2, 2001, Pages 182-190

Relations between the deposition conditions, the microstructure and the defects in PECVD hydrogenated amorphous carbon films; influence on the electronic density of states

(3) Theye, M L a Paret, V a Sadki, A a

a CNRS (France)

Author keywords

Amorphous carbon films; Deposition; Electronic states density; Microstructure

Indexed keywords

DEPOSITION; ELECTRIC POTENTIAL; FILM GROWTH; ION BOMBARDMENT; MICROSTRUCTURE; MICROWAVES; SUBSTRATES;

ATOMS CLUSTERING;

AMORPHOUS FILMS;

DEFECT;

EID: 0035248407 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(00)00466-0 Document Type: Article

Times cited : (53)

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