Effects of deposition parameters on laser-induced damage threshold of Ta2O5 films

Optics and Laser Technology

Volumn 42, Issue 3, 2010, Pages 497-502

  Xu, Cheng ^a   Qiang, Yinghuai ^a   Zhu, Yabo ^a   Shao, Jianda ^b   Fan, Zhengxiu ^b   Han, Jinhong ^c  

^a CHINA UNIVERSITY OF MINING AND TECHNOLOGY   (China)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^c Dazhong News Group   (China)

Author keywords

Absorption; Damage threshold; Ta2O5 films

Indexed keywords

1064 NM LASERS; ABSORPTION DAMAGE; CHEMICAL COMPOSITIONS; DAMAGE MECHANISM; DEPOSITION PARAMETERS; E BEAM EVAPORATION; LASER INDUCED DAMAGE THRESHOLDS; ND: YAG; OXYGEN PRESSURE; PULSE LENGTH; SUBSTRATE TEMPERATURE; SURFACE THERMAL LENSING TECHNIQUE; TOTAL INTEGRATED SCATTERINGS;

ABSORPTION; DAMAGE DETECTION; DEPOSITION; DEPOSITION RATES; LASER DAMAGE; LASERS; NEODYMIUM LASERS; OPTICAL PROPERTIES; OXYGEN; PULSED LASER APPLICATIONS; SCATTERING; SUBSTRATES; TANTALUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 71549137445     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2009.09.004     Document Type: Article

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