Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector

Journal of the Optical Society of America B: Optical Physics

Volumn 24, Issue 3, 2007, Pages 538-543

  Yuan, Lei ^a,b   Zhao, Yuanan ^a   Shang, Guangqiang ^a,b   Wang, Chengren ^a,b   He, Hongbo ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; HAFNIUM COMPOUNDS; LASER BEAM EFFECTS; MORPHOLOGY; REFLECTIVE COATINGS; ULTRASHORT PULSES;

LASER-INDUCED DAMAGE THRESHOLDS (LIDTS); NANOSECOND LASER; SINGLE-PULSE FEMTOSECOND LASER;

LASER DAMAGE;

EID: 34047124257     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.24.000538     Document Type: Article

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