Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films

Optics and Laser Technology

Volumn 40, Issue 3, 2008, Pages 545-549

  Xu, Cheng ^a   Li, Dawei ^a   Ma, Jianyong ^a   Jin, Yunxia ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Absorption; Laser induced damage threshold; SiO2 additional layers; Ta2O5 films

Indexed keywords

ABSORPTION SPECTRA; COMPUTER SOFTWARE; LASER BEAM EFFECTS; THIN FILMS;

LASER INDUCED DAMAGE THRESHOLD; THIN FILM DESIGN SOFTWARE;

SILICA;

EID: 35448980306     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2007.08.008     Document Type: Article

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