Laser-induced damage threshold in n-on-1 regime of Ta2O5 films at 532, 800, and 1064 nm

Chinese Optics Letters

Volumn 5, Issue 12, 2007, Pages 727-729

  Xu, Cheng ^a,b   Yao, Jianke ^a,b   Ma, Jianyong ^a,b   Jin, Yunxia ^a   Shao, Jianda ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRON BEAMS; EVAPORATION; LASER DAMAGE; OPTICAL PROPERTIES; TANTALUM COMPOUNDS;

ELECTRON BEAM EVAPORATION; LASER INDUCED DAMAGE THRESHOLDS (LIDTS);

OPTICAL FILMS;

EID: 38349071763     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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