Investigation of annealing effects on the laser-induced damage threshold of amorphous Ta2O5 films

Optics and Laser Technology

Volumn 41, Issue 3, 2009, Pages 258-263

  Xu, Cheng ^a,b   Dong, Hongcheng ^a,b   Yuan, Lei ^a,b   He, Hongbo ^a   Shao, Jianda ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Annealing; Laser induced damage threshold; Ta2O5 films

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; DAMAGE DETECTION; ELECTRON BEAMS; LASER DAMAGE; LASERS; NEODYMIUM LASERS; PHOTOELECTRON SPECTROSCOPY; PULSED LASER APPLICATIONS; SCATTERING; TANTALUM; THERMAL EVAPORATION; X RAY PHOTOELECTRON SPECTROSCOPY;

AND SCATTERINGS; ANNEALING EFFECTS; ANNEALING TEMPERATURES; CHEMICAL COMPOSITIONS; DAMAGE THRESHOLDS; ELECTRON BEAM EVAPORATION METHODS; ND:YAG LASERS; PULSE LENGTHS; ROOT MEAN SQUARES; SCATTERING AND ABSORPTIONS; STRUCTURAL DEFECTS; SURFACE THERMAL LENSING TECHNIQUES; TA2O5 FILMS; TOTAL INTEGRATED SCATTERINGS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ANNEALING;

EID: 56949098161     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2008.06.009     Document Type: Article

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