Characterization of LaF 3 coatings prepared at different temperatures and rates

Applied Surface Science

Volumn 254, Issue 6, 2008, Pages 1783-1788

  Yu, Hua ^a,b   Shen, Yanming ^a,b   Cui, Yun ^a,b   Qi, Hongji ^a   Shao, JianDa ^a   Fan, ZhengXiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Deposition rate; LaF 3 film; LIDT; Substrate temperature

Indexed keywords

COATING TECHNIQUES; CRYSTAL STRUCTURE; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION RATE; LIDT; SUBSTRATE TEMPERATURE; THERMAL BOAT EVAPORATION;

THIN FILMS;

EID: 37349075887     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.07.143     Document Type: Article

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