Influence of polishing and cleaning on the laser-induced damage threshold of substrates and coatings at 1064 nm

Optical Engineering

Volumn 46, Issue 2, 2007, Pages

  Krol, Hélène ^a,b   Gallais, Laurent ^a   Commandré, Mireille ^a   Grèzes Besset, Catherine ^b   Tarricini, Didier ^b   Lagier, Guy ^b  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b CILAS Marseille   (France)

Author keywords

Cleaning; Laser induced damage; Polishing; SiO2Ta2 O5 antireflection coating

Indexed keywords

ANTIREFLECTION COATINGS; CLEANING; FOCUSED ION BEAMS; ION BEAM ASSISTED DEPOSITION; NEODYMIUM LASERS; POLISHING; SILICA; STATISTICAL METHODS; SUBSTRATES;

DUAL-ION-BEAM SPUTTERING; LASER-INDUCED DAMAGE THRESHOLD;

LASER DAMAGE;

EID: 34347383163     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2542122     Document Type: Article

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