Influence of different substrates on laser induced damage thresholds at 1064 nm of Ta2O5 films

Chinese Physics Letters

Volumn 25, Issue 4, 2008, Pages 1321-1324

  Xu, Cheng ^a,b   Ma, Jian Yong ^a,b   Jin, Yun Xia ^a   He, Hong Bo ^a   Shao, Jian Da ^a   Fan, Zheng Xiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; FUSED SILICA; INTERFACES (MATERIALS); REFRACTIVE INDEX; SUBSTRATES; TANTALUM OXIDES;

1064 NM; ANTIREFLECTION; DIFFERENT SUBSTRATES; ELECTRON BEAM EVAPORATION METHODS; EXTINCTION INDEX; HIGH REFLECTOR; LASER INDUCED DAMAGE THRESHOLDS; OPTICAL LASERS; SUBSTRATE PROPERTIES; THREE PARAMETERS;

LASER DAMAGE;

EID: 43049136648     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/25/4/043     Document Type: Article

References (17)