Mechanical properties of sputtered silicon nitride thin films

Journal of Applied Physics

Volumn 94, Issue 12, 2003, Pages 7868-7873

  Vila, M ^a   Caceres D ^b   Prieto, C ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b UNIVERSIDAD CARLOS III DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BONDING; CHEMICAL BONDS; ELASTIC MODULI; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; MOLECULAR DYNAMICS; NITROGEN; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SILICON NITRIDE; SPUTTERING; STOICHIOMETRY; X RAY DIFFRACTION ANALYSIS;

ELASTIC COMPONENTS; NANOINDENTATION;

THIN FILMS;

EID: 0346935132     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1626799     Document Type: Article

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