Magnetic nanostructures fabricated by the atomic force microscopy nano-lithography technique

Nanotechnology

Volumn 15, Issue 10, 2004, Pages

  Watanabe, K ^a   Takemura, Y ^a   Shimazu, Y ^a   Shirakashi, J ^b  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b AKITA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COULOMB BLOCKADE; FABRICATION; LITHOGRAPHY; MAGNETIC DOMAINS; MAGNETORESISTANCE; METALLIC FILMS; NANOTECHNOLOGY; OXIDATION; RANDOM ACCESS STORAGE; SCHEMATIC DIAGRAMS; SEMICONDUCTOR JUNCTIONS;

DRAIN CURRENTS; MAGNETIC RANDOM ACCESS MEMORY (MRAM); POWER CONSUMPTION; SINGLE ELECTRON DEVICES;

NANOSTRUCTURED MATERIALS;

EID: 7044251922     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/10/012     Document Type: Conference Paper

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