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Volumn 9, Issue 7, 2009, Pages 4338-4341
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Metal patterning process on rigid and flexible substrates using nanoimprint lithography and resist pattern transfer technique
a a a a |
Author keywords
Lift off process; Rabbit ear shaped defect; Resist pattern transfer; UV curable adhesive; UV nanoimprint lithography (UV NIL)
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Indexed keywords
LIFT-OFF PROCESS;
RABBIT EAR SHAPED DEFECT;
RESIST PATTERN TRANSFER;
UV CURABLE ADHESIVE;
UV NANOIMPRINT LITHOGRAPHY (UV-NIL);
ACETONE;
ASPECT RATIO;
DEFECTS;
METALS;
PHOTORESISTS;
POLYETHYLENE TEREPHTHALATES;
REACTIVE ION ETCHING;
SILICON;
SUBSTRATES;
THERMOPLASTICS;
NANOIMPRINT LITHOGRAPHY;
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EID: 70350309806
PISSN: 15334880
EISSN: None
Source Type: Journal
DOI: 10.1166/jnn.2009.M56 Document Type: Conference Paper |
Times cited : (9)
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References (18)
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