UV curing nanoimprint lithography for uniform layers and minimized residual layers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 12, 2004, Pages 8369-8373

  Lee, Heon ^a   Jung, Gun Young ^b  

^a Korea University   (South Korea)

^b HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

High fidelity pattern transfer; No residual layer; Pressurized chamber imprinting system; Self assembled monolayer; UV curing nanoimprinting lithography; UV curing resin

Indexed keywords

CURING; FABRICATION; PATTERN RECOGNITION; POLYMERS; RESINS; ULTRAVIOLET RADIATION; VISCOSITY; X RAYS;

HIGH FIDELITY PATTERN TRANSFER; NO RESIDUAL LAYERS; PRESSURIZED CHAMBER IMPRINTING SYSTEM; SELF-ASSEMBLING MONOLAYERS; UV CURING NANOIMPRINTING LITHOGRAPHY; UV CURING RESIN;

LITHOGRAPHY;

EID: 13644277078     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.8369     Document Type: Article

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