Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template

Solid State Phenomena

Volumn 121-123, Issue PART 1, 2007, Pages 661-664

  Lee, H ^a   Yang, K Y ^a   Hong, S ^a   Schaper, C D ^b   Jung, G Y ^c  

^a Korea University   (South Korea)

^b Transfer Devices Inc   (United States)

^c HEWLETT PACKARD COMPANY   (United States)

Author keywords

Mirror image pattern; Nano imprint lithography; Nano pattern duplication; Poly(vinyl alcohol); Thermally curable monomer; Water soluble stamp

Indexed keywords

POLYVINYL ALCOHOLS; SILICON WAFERS; ULTRAVIOLET RADIATION;

MIRROR IMAGE PATTERN; NANO-PATTERN DUPLICATION; THERMALLY CURABLE MONOMER; WATER SOLUBLE STAMP;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; POLYVINYL ALCOHOL; ULTRAVIOLET RADIATION;

EID: 38549113575     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/3-908451-30-2.661     Document Type: Conference Paper

References (3)

1. C. D. Schaper, Journal of Microlithography, Microfabrication and Microsystem Vol. 3 (2004), p. 174
2. C. D. Schaper, Nano Letter Vol. 3 (2003), p. 1305
3. H. Lee, G-Y Jung, Microelectronic Engineering, Vol. 77 (2005), p. 168